Octafluorocyclopentene Gas

Octafluorocyclopentene je toksična, nezapaljiva, niska tačka ključanja (81 stepeni f) bezbojna tečnost s blagim karakterističnim mirisom.

Octafluorocyclopentene sa 99,99% dobavljača proizvođača čistoće Jiangsu MR CHEMICAL Co., Ltd

CAS: 559-40-0

Einecs: 209-203-0

UN: 2810

Molekularna formula: C5F8

Octafluorocyclopentene gas is gaining recognition as a superior etching medium in semiconductor fabrication due to its unique cyclic molecular structure. Unlike linear perfluorocarbons, octafluorocyclopentene gas demonstrates exceptional plasma stability and precise etching characteristics that enable superior profile control in high aspect ratio features. The gas's relatively high boiling point (-6°C) allows for easier handling compared to other etching gases, while its density (approximately 6.8 times heavier than air) requires specific safety protocols to prevent accumulation in confined spaces. Recent breakthroughs in 3D NAND flash memory production have particularly benefited from octafluorocyclopentene gas's ability to maintain consistent etch rates across deep trench structures. Environmental considerations surrounding octafluorocyclopentene gas focus on its global warming potential (estimated GWP of 7,200), prompting development of advanced abatement systems that can destroy over 99% of used gas. The compound's thermal stability (decomposition temperature >550 stepeni) čini ga jednako vrijednim kao dielektrični medij u specijalizovanoj visokonaponskoj opremi u kojoj tradicionalni izolatori ne uspiju.

Octafluorocyclopentene (OFCP) se prvenstveno koristi u poluvodičkoj industriji, posebno za procese iskarenja u plazmi. To je i početni materijal za sintezaciju drugih perfluoriranih spojeva koji se koriste u optoelektronskim uređajima i drugim aplikacijama.

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